Author: Kobayashi, Y.
Paper Title Page
MOPCTH010 Design Work of the ERL-FEL as the High Intense EUV Light Source 4
 
  • N. Nakamura, S. Chen, T. Furuya, K. Haga, I. Hanyu, K. Harada, T. Honda, Y. Honda, E. Kako, Y. Kamiya, R. Kato, H. Kawata, Y. Kobayashi, T. Konomi, T. Kubo, S. Michizono, T. Miyajima, H. Nakai, T. Obina, K. Oide, H. Sakai, S. Sakanaka, M. Shimada, K. Tsuchiya, K. Umemori, M. Yamamoto
    KEK, Ibaraki, Japan
  • R. Hajima, N. Nishimori
    JAEA, Ibaraki-ken, Japan
  
  Energy recovery linac(ERL)-based free electron lasers(FELs) are promising candidates for high-power EUV sources. They can recover most acceleration energy from the electron beams and greatly reduce the dumped beam power and activation compared with those based on ordinary linear accelerators. We have investigated a feasible design of a 10-kW class ERL-FEL operated at 13.5 nm for EUV lithography applications. In this talk, we will present the design work of the ERL-FEL as the high-power EUV source.  
slides icon Slides MOPCTH010 [4.589 MB]  
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