Euclid Beamlabs LLC, Bolingbrook, USA
GWU, Washington, USA
University of Arkansas, Fayetteville, Arkansas, USA
JLab, Newport News, Virginia, USA
We present progress on incorporation of nanopillar arrays into spin-polarized gallium arsenide photocathodes in pursuit of record high tolerance to ion back-bombardment. Our goal is to exceed the 400 Coulomb record for a high polarization milliampere-class electron source set at Jefferson Laboratory in 2017, while maintaining high quantum efficiency (QE) and spin polarization with a superlattice. Because the Mie effect is resonant, uniformity and careful control over nanostructure geometry is key. We report excellent uniformity and straight sidewall geometry with improved optical absorption using a painstakingly optimized inductively coupled plasma reactive ion etch. We also report the application of Kerker theory to spin-polarized photocathode nanopillar arrays, setting new requirements on nanostructure dimensions to avoid spoiling spin polarization. Finally, we also report initial steps toward re-establishing U.S. production of strained superlattice photocathodes towards integration with nanopillar arrays.
Euclid Beamlabs LLC, Bolingbrook, USA
Euclid TechLabs, LLC, Solon, Ohio, USA
JLab, Newport News, Virginia, USA
Euclid Beamlabs is developing a new "Black Gun" concept in direct current (DC) photoinjectors. To reduce electron-stimulated desorption indirectly influenced by stray photoemission, we are testing advanced optical coatings and low-scattering optics compatible with the extreme high vacuum (XHV) environment of modern DC photoinjectors. Stray light in DC photoinjectors (in proportion to the photoemitted charge) causes off-nominal photoemission, initiating electron trajectories which intercept downstream surfaces. This causes electron-stimulated desorption of atoms, which ionize and may back-bombard the cathode, reducing its charge lifetime. Back-bombardment is key for high average current or high repetition rate. First, we report on progress developing optical skimmers based on Butler baffles to collimate both incoming and outgoing laser beams. Second, we describe candidate coatings for reduction of scattered light. Requirements for these coatings are that they be conducting, optically black at the drive laser wavelength, conformally applied to complex geometry, and XHV-compatible with negligible outgassing.
Euclid TechLabs, LLC, Solon, Ohio, USA
Euclid Beamlabs LLC, Bolingbrook, USA
Benefiting from the rapid progress on RF photocathode gun technologies in the past two decades, the development of MeV-range ultrafast electron diffraction/microscopy (UED and UEM) has been identified as an enabling instrumentation, which may lead to breakthroughs in fundamental science and applied technologies *. Euclid is designing an SRF cavity as the UEM electron gun. As implementing a solenoid for emittance compensation in the gun is limited by the superconductivity performance and available space, the geometry of the first 0.3 cell of the cavity is optimized for transverse focusing and emittance reduction.
*: T. Chase, et al, "Ultrafast electron diffraction from non- equilibrium phonons in femtosecond laser heated Au films." Applied Physics Letters, 2016
ANL, Lemont, Illinois, USA
Euclid Beamlabs LLC, Bolingbrook, USA
The RF system of Argonne Wakefield Accelerator (AWA) facility has grown over the years from one RF power station into 4 RF power stations. The demand for RF power keeps growing as the capability of AWA continues to grow. Now the 5th RF station is needed to fulfill the RF power needs of AWA facility. Some details regarding the construction and commissioning of the 5th RF station of AWA facility are documented in this paper.
ANL, Lemont, Illinois, USA
Euclid Beamlabs LLC, Bolingbrook, USA
Beam position monitor (BPM) is widely used in accelerator facilities worldwide. It is a device which is capable of providing, non-destructively, accurate beam centroid and charge information of a passing charged beam. A typical BPM system contains customized hardware and specialized processing electronics. The cost is often too high for small facilities to afford them. As a small facility, Argonne Wakefield Accelerator (AWA) decided to develop a solution with high cost-efficiency to fit in its budget. Some details about the development are presented in this paper.