IPAC2018 - List of Authors (Schmidt, M.)

Paper	Title	Page
TUYGBF3	An EBIS-Based Low-Energy Accelerator for Fine-Focussed Ion Beams	647
	M. Schmidt, P. Laux, G.H. Zschornack DREEBIT, Dresden, Germany
	Technologies based on focused ion beams have become indispensable for research institutions as well as commercial laboratories and high-tech production facilities (micro- and nanotechnology, semiconductor technology). We report on a compact setup combining an Electron Beam Ion Source (EBIS), a Wien filter for ion species separation, and a fine focusing ion acceleration column capable of producing ion beams with beam diameters in the micrometer range at ion beam energies up to the MeV range. Almost all elements of the periodic system can be injected into the EBIS to produce a broad spectrum of ion charge states with only one ion source. The beam energy of a selected ion species can easily be varied by changing the electric potential of the EBIS drift tube in which the ions are generated, resulting in different implantation depths in various solids. We present studies on beam diameter and emittance, available charge states, and SEM imaging as application.
	Slides TUYGBF3 [3.972 MB]
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-TUYGBF3
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

An EBIS-Based Low-Energy Accelerator for Fine-Focussed Ion Beams

647

M. Schmidt, P. Laux, G.H. Zschornack
DREEBIT, Dresden, Germany

Technologies based on focused ion beams have become indispensable for research institutions as well as commercial laboratories and high-tech production facilities (micro- and nanotechnology, semiconductor technology). We report on a compact setup combining an Electron Beam Ion Source (EBIS), a Wien filter for ion species separation, and a fine focusing ion acceleration column capable of producing ion beams with beam diameters in the micrometer range at ion beam energies up to the MeV range. Almost all elements of the periodic system can be injected into the EBIS to produce a broad spectrum of ion charge states with only one ion source. The beam energy of a selected ion species can easily be varied by changing the electric potential of the EBIS drift tube in which the ions are generated, resulting in different implantation depths in various solids. We present studies on beam diameter and emittance, available charge states, and SEM imaging as application.

Slides TUYGBF3 [3.972 MB]

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2018-TUYGBF3

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)