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RIS citation export for WEPCAV002: Improvement of Chemical Etching Capabilities (BCP) for SRF Spoke Resonators at IJCLab

TY  - CONF
AU  - Demercastel-Soulier, J.
AU  - Duchesne, P.
AU  - Longuevergne, D.
AU  - Olry, G.
AU  - Pépin-Donat, T.
AU  - Rabehasy, F.
AU  - Reynet, D.
AU  - Roset, S.
AU  - Vogt, L.M.
ED  - Saito, Kenji
ED  - Xu, Ting
ED  - Sakamoto, Naruhiko
ED  - Lesage, Ana
ED  - Schaa, Volker R.W.
TI  - Improvement of Chemical Etching Capabilities (BCP) for SRF Spoke Resonators at IJCLab
J2  - Proc. of SRF2021, East Lansing, MI, USA, 28 June-02 July 2021
CY  - East Lansing, MI, USA
T2  - International Conference on RF Superconductivity
T3  - 20
LA  - english
AB  - Buffered chemical polishing (BPC) is the reference surface polishing adopted for ESS and MYRRHA SRF spoke resonators at IJCLab. This chemical treatment, in addition to improving the RF performance, fits into the frequency adjustment strategy of the jacketed cavity during its preparation phase. In the framework of the collaboration with Fermilab for PIP-II project, IJCLab has developed a new setup to perform rotational BCP. The implementation of a rotation during chemical etching improves significantly the homogeneity and quality of surface polishing. In this paper, we present the numerical analysis based on a fluid dynamics model. The goal is to estimate the acid flow characteristics inside the cavity, determine the influence of several parameters as mass flow rate and rotation speed and propose the best configuration for the new experimental setup
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 590
EP  - 593
KW  - cavity
KW  - simulation
KW  - SRF
KW  - HOM
KW  - niobium
DA  - 2022/10
PY  - 2022
SN  - 2673-5504
SN  - 978-3-95450-233-2
DO  - doi:10.18429/JACoW-SRF2021-WEPCAV002
UR  - https://jacow.org/srf2021/papers/wepcav002.pdf
ER  -