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RIS citation export for WEPCAV001: Study of the Niobium Oxide Structure and Microscopic Effect of Plasma Processing on the Niobium Surface

TY  - CONF
AU  - Giaccone, B.
AU  - Martinello, M.
AU  - Zasadzinski, J.
ED  - Saito, Kenji
ED  - Xu, Ting
ED  - Sakamoto, Naruhiko
ED  - Lesage, Ana
ED  - Schaa, Volker R.W.
TI  - Study of the Niobium Oxide Structure and Microscopic Effect of Plasma Processing on the Niobium Surface
J2  - Proc. of SRF2021, East Lansing, MI, USA, 28 June-02 July 2021
CY  - East Lansing, MI, USA
T2  - International Conference on RF Superconductivity
T3  - 20
LA  - english
AB  - A study of the niobium oxide structure is presented here, with particular focus on the niobium suboxides. Multiple steps of argon sputtering and XPS measurements were carried out until the metal surface was exposed. The sample was then exposed to air and the oxide regrowth was studied. In addition, three Nb samples prepared with different surface treatments were studied before and after being subjected to plasma processing. The scope is investigating the microscopic effect that the reactive oxygen contained in the glow discharge may have on the niobium surface. This study suggests that the Nb₂O₅ thickness may increase, although no negative change in the cavity performance is measured since the pentoxide is a dielectric.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 585
EP  - 589
KW  - plasma
KW  - niobium
KW  - cavity
KW  - background
KW  - ECR
DA  - 2022/10
PY  - 2022
SN  - 2673-5504
SN  - 978-3-95450-233-2
DO  - doi:10.18429/JACoW-SRF2021-WEPCAV001
UR  - https://jacow.org/srf2021/papers/wepcav001.pdf
ER  -