JACoW is a publisher in Geneva, Switzerland that publishes the proceedings of accelerator conferences held around the world by an international collaboration of editors.
Z. Sun et al., “Toward Stoichiometric and Low-Surface-Roughness Nb₃Sn Thin Films via Direct Electrochemical Deposition”, in Proc. SRF'21, East Lansing, MI, USA, Jun.-Jul. 2021, pp. 710-713. doi:10.18429/JACoW-SRF2021-WEOTEV03