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RIS citation export for SUPTEV002: Application of Plasma Electrolytic Polishing onto SRF Substrates

TY  - CONF
AU  - Chyhyrynets, E.
AU  - Azzolini, O.
AU  - Caforio, R.
AU  - Garcia Diaz, V.A.
AU  - Keppel, G.
AU  - Pira, C.
AU  - Stivanello, F.
AU  - Zanierato, M.
ED  - Saito, Kenji
ED  - Xu, Ting
ED  - Sakamoto, Naruhiko
ED  - Lesage, Ana
ED  - Schaa, Volker R.W.
TI  - Application of Plasma Electrolytic Polishing onto SRF Substrates
J2  - Proc. of SRF2021, East Lansing, MI, USA, 28 June-02 July 2021
CY  - East Lansing, MI, USA
T2  - International Conference on RF Superconductivity
T3  - 20
LA  - english
AB  - A new promising approach of SRF substrates surface treatment has been studied - Plasma Electrolytic Polishing (PEP). The possible application of PEP can be used not only on conventional elliptical resonators, but also on other components of SRF such as, for example, couplers or Quadrupole resonators (QPRs). However, SRF application of PEP represents a challenge since it requires a different approach to treat the inner surface of elliptical cavities respect to electropolishing. In this work, the main problematics and possible solutions, the equipment, and the polishing system requirements will be shown. A proposed polishing system for 6 GHz elliptical cavities and QPRs will be shown and discussed.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 116
EP  - 120
KW  - cathode
KW  - SRF
KW  - plasma
KW  - cavity
KW  - power-supply
DA  - 2022/10
PY  - 2022
SN  - 2673-5504
SN  - 978-3-95450-233-2
DO  - doi:10.18429/JACoW-SRF2021-SUPTEV002
UR  - https://jacow.org/srf2021/papers/suptev002.pdf
ER  -