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RIS citation export for MOPTEV014: New Improved Horizontal Electropolishing System for SRF Cavities

TY  - CONF
AU  - Reece, C.E.
AU  - Castagnola, S.
AU  - Denny, P.
AU  - Mitchell, A.L.A.
ED  - Saito, Kenji
ED  - Xu, Ting
ED  - Sakamoto, Naruhiko
ED  - Lesage, Ana
ED  - Schaa, Volker R.W.
TI  - New Improved Horizontal Electropolishing System for SRF Cavities
J2  - Proc. of SRF2021, East Lansing, MI, USA, 28 June-02 July 2021
CY  - East Lansing, MI, USA
T2  - International Conference on RF Superconductivity
T3  - 20
LA  - english
AB  - The best performance of niobium SRF accelerating cavities is obtained with surfaces smoothed with electropolishing chemical finishing. Jefferson Lab has recently specified, procured, installed, and commissioned a new versatile production electropolishing (EP) tool. Experience with EP research and operations at JLab as well as vendor interactions and experience guided development of the system specification. Detailed design and fabrication was awarded by contract to Semiconductor Process Equipment Corporation (SPEC). The delivered system was integrated into the JLab chemroom infrastructure and commissioned in 2020. The new EP tool provides much improved heat exchange from the circulating H₂SO₄/HF electrolyte and also the cavity via variable temperature external cooling water flow, resulting in quite uniform cavity wall temperature control and thus improved removal uniformity. With the JLab infrastructure, stabilized process temperature as low as 5 C is available. We describe the system and illustrate operational modes in this contribution.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 237
EP  - 240
KW  - cavity
KW  - controls
KW  - cathode
KW  - operation
KW  - MMI
DA  - 2022/10
PY  - 2022
SN  - 2673-5504
SN  - 978-3-95450-233-2
DO  - doi:10.18429/JACoW-SRF2021-MOPTEV014
UR  - https://jacow.org/srf2021/papers/moptev014.pdf
ER  -