SRF2019 - List of Authors (Hu, H.)

Paper	Title	Page
MOP013	Reducing Surface Roughness of Nb₃Sn Through Chemical Polishing Treatments	48
	H. Hu, M. Liepe, R.D. Porter Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
	Niobium-3 tin (Nb₃Sn) is a promising alternative material for SRF cavities, with theoretical limits for critical temperatures and superheating fields reaching twice that of conventional Nb cavities. However, currently achievable accelerating gradients in Nb₃Sn cavities are much lower than their theoretical limit. One limitation to the maximum accelerating gradient is surface magnetic field enhancement caused by the surface roughness of Nb₃Sn. However, there are currently no standard techniques used to reduce Nb₃Sn surface roughness. Since Nb₃Sn is only 2-3 microns thick, it is difficult to selectively polish Nb₃Sn without removing the entire layer. Here, we investigate reducing the surface roughness of Nb₃Sn through applying chemical polishing treatments, including modified versions of standard techniques such as Buffered Chemical Polishing (BCP) and Electropolishing (EP). Through data acquired from Atomic Force Microscope (AFM) scans, SEM scans, and SEM-EDS analysis, we show the effects of these chemical treatments in reducing surface roughness and consider the changes in the chemical composition of Nb₃Sn that may occur through the etching process. We find that BCP with a 1:1:8 solution is ineffective while EP halves the surface roughness of Nb₃Sn.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-SRF2019-MOP013
About •	paper received ※ 01 July 2019 paper accepted ※ 04 July 2019 issue date ※ 14 August 2019
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

Reducing Surface Roughness of Nb₃Sn Through Chemical Polishing Treatments

48

H. Hu, M. Liepe, R.D. Porter
Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA

Niobium-3 tin (Nb₃Sn) is a promising alternative material for SRF cavities, with theoretical limits for critical temperatures and superheating fields reaching twice that of conventional Nb cavities. However, currently achievable accelerating gradients in Nb₃Sn cavities are much lower than their theoretical limit. One limitation to the maximum accelerating gradient is surface magnetic field enhancement caused by the surface roughness of Nb₃Sn. However, there are currently no standard techniques used to reduce Nb₃Sn surface roughness. Since Nb₃Sn is only 2-3 microns thick, it is difficult to selectively polish Nb₃Sn without removing the entire layer. Here, we investigate reducing the surface roughness of Nb₃Sn through applying chemical polishing treatments, including modified versions of standard techniques such as Buffered Chemical Polishing (BCP) and Electropolishing (EP). Through data acquired from Atomic Force Microscope (AFM) scans, SEM scans, and SEM-EDS analysis, we show the effects of these chemical treatments in reducing surface roughness and consider the changes in the chemical composition of Nb₃Sn that may occur through the etching process. We find that BCP with a 1:1:8 solution is ineffective while EP halves the surface roughness of Nb₃Sn.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-SRF2019-MOP013

About •

paper received ※ 01 July 2019 paper accepted ※ 04 July 2019 issue date ※ 14 August 2019

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)