SRF2019 - List of Authors (Connolly, A.B.)

Paper	Title	Page
MOP014	Electroplating of Sn Film on Nb Substrate for Generating Nb₃Sn Thin Films and Post Laser Annealing	51
SUSP036	use link to see paper's listing under its alternate paper code
	Z. Sun, M. Liepe, T.E. Oseroff, R.D. Porter Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA T. Arias, A.B. Connolly, J.M. Scholtz, N. Sitaraman, M.O. Thompson Cornell University, Ithaca, USA X. Deng University of Virginia, Charlottesville, Virginia, USA K.D. Dobson University of Delaware, Newark, Delaware, USA
	Controlling film quality of Nb₃Sn is critical to its SRF cavity performance. The state-of-the-art vapor diffusion approach for Nb₃Sn deposition observed surface roughness, thin grain regions, and misfit dislocations which negatively affect the RF performance. The Sn deficiency and non-uniformity at the nucleation stage of vapor deposition is believed to be the fundamental reason to cause these roughness and defects issues. Thus, we propose to pre-deposit a uniform Sn film on the Nb substrate, which is able to provide sufficient Sn source during the following heat treatment for Nb₃Sn nucleation and growth. Here, we demonstrated successful electrodeposition of a low-roughness, dendrite-free, excellent-adhesion Sn film on the Nb substrate. More importantly, we further achieved a uniform, low-roughness (Ra = 66 nm), pure-stoichiometric Nb₃Sn film through thermal treatment of this electroplated Sn film in the furnace. Additionally, we provide preliminary results of laser annealing as a post treatment for epitaxial grain growth and roughness reduction.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-SRF2019-MOP014
About •	paper received ※ 22 June 2019 paper accepted ※ 30 June 2019 issue date ※ 14 August 2019
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

MOP014

Electroplating of Sn Film on Nb Substrate for Generating Nb₃Sn Thin Films and Post Laser Annealing

51

SUSP036

use link to see paper's listing under its alternate paper code

Z. Sun, M. Liepe, T.E. Oseroff, R.D. Porter
Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
T. Arias, A.B. Connolly, J.M. Scholtz, N. Sitaraman, M.O. Thompson
Cornell University, Ithaca, USA
X. Deng
University of Virginia, Charlottesville, Virginia, USA
K.D. Dobson
University of Delaware, Newark, Delaware, USA

Controlling film quality of Nb₃Sn is critical to its SRF cavity performance. The state-of-the-art vapor diffusion approach for Nb₃Sn deposition observed surface roughness, thin grain regions, and misfit dislocations which negatively affect the RF performance. The Sn deficiency and non-uniformity at the nucleation stage of vapor deposition is believed to be the fundamental reason to cause these roughness and defects issues. Thus, we propose to pre-deposit a uniform Sn film on the Nb substrate, which is able to provide sufficient Sn source during the following heat treatment for Nb₃Sn nucleation and growth. Here, we demonstrated successful electrodeposition of a low-roughness, dendrite-free, excellent-adhesion Sn film on the Nb substrate. More importantly, we further achieved a uniform, low-roughness (Ra = 66 nm), pure-stoichiometric Nb₃Sn film through thermal treatment of this electroplated Sn film in the furnace. Additionally, we provide preliminary results of laser annealing as a post treatment for epitaxial grain growth and roughness reduction.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-SRF2019-MOP014

About •

paper received ※ 22 June 2019 paper accepted ※ 30 June 2019 issue date ※ 14 August 2019

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)