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RIS citation export for THP010: The Mechanism of Electropolishing of Niobium from Choline Chloride-based Deep Eutectic Solvents

TY  - CONF
AU  - Chu, Q.W.
AU  - Guo, H.
AU  - Huang, S.C.
AU  - Wu, A.D.
AU  - You, Z.M.
ED  - Michel, Peter
ED  - Arnold, André
ED  - Schaa, Volker RW
TI  - The Mechanism of Electropolishing of Niobium from Choline Chloride-based Deep Eutectic Solvents
J2  - Proc. of SRF2019, Dresden, Germany, 30 June-05 July 2019
CY  - Dresden, Germany
T2  - International Conference on RF Superconductivity
T3  - 19
LA  - english
AB  - The mechanism of electropolishing of niobium (Nb) from choline chloride-based deep eutectic solvent (DES) was studied by anodic polarization tests and electrochemical impedance spectroscopy (EIS) using a Nb rotating disk electrode (RDE). Based on the results of an anodic polarisation test, the electropolishing of Nb is mass transport controlled. EIS results are consistent with the compact salt film mechanism for niobium electropolishing in this electrolyte. The influence of rotation rate, applied potential and electrolyte temperature on the electropolishing mechanism of Nb was investigated. As the applied potential positively shift, Rct, Rp and L increase, CPE decrease and Rs unchanged. The increase in rotation rate and electrolyte temperature leads to a decrease of Rs, Rct, Rp and L, and an increase of CPE.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 852
EP  - 856
KW  - ECR
KW  - polarization
KW  - impedance
KW  - niobium
KW  - cavity
DA  - 2019/08
PY  - 2019
SN  - ""
SN  - 978-3-95450-211-0
DO  - doi:10.18429/JACoW-SRF2019-THP010
UR  - http://jacow.org/srf2019/papers/thp010.pdf
ER  -