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TY - CONF AU - Peshl, J.J. AU - Popović, S. AU - Upadhyay, J. AU - Valente-Feliciano, A-M. AU - Vušković, L. ED - Schaa, Volker RW ED - He, Yuan ED - Li, Lu ED - Zhao, Ning TI - The Effect of Process Parameters on the Surface Properties of Niobium During Plasma Etching J2 - Proc. of SRF2017, Lanzhou, China, July 17-21, 2017 C1 - Lanzhou, China T2 - International Conference on RF Superconductivity T3 - 18 LA - english AB - We have shown that plasma etching using an electronegative Ar/Cl2 discharge can effectively remove surface oxide layers on Nb samples as well as bulk Nb from single cell SRF cavities*. With accelerating fields on the order of wet etching processes and a decrease in field emission the use of plasma assisted etching for bulk Nb processing is a worthwhile endeavor. We are presenting the surface properties of plasma etched Nb. Cavity grade Nb coupons were made by water jet cutting, and then polished to achieve surface roughness equivalent to electropolishing (<1 micron). The coupons were plasma etched while process parameters (rf power, gas pressure, temperature and DC bias voltage) are varied. These samples are placed on the inner surface of the cylindrical cavity to be etched. The experimental setup is similar to the single cell cavity plasma etching setup. Each sample is weighed and scanned before and after plasma processing with an AFM, SEM, and digital optical microscope that provide both atomic composition and surface roughness profiles. Comparing the scans allows us to make conclusions about the effect of each parameter on the surface roughness. PB - JACoW CP - Geneva, Switzerland SP - 628 EP - 630 KW - ion KW - plasma KW - cavity KW - experiment KW - SRF DA - 2018/01 PY - 2018 SN - 978-3-95450-191-5 DO - 10.18429/JACoW-SRF2017-TUPB098 UR - http://jacow.org/srf2017/papers/tupb098.pdf ER -