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RIS citation export for THPB055: Plasma-enhanced ALD System for SRF Cavity

TY - CONF
AU - Kato, S.
AU - Hayano, H.
ED - Schaa, Volker RW
ED - He, Yuan
ED - Li, Lu
ED - Zhao, Ning
TI - Plasma-enhanced ALD System for SRF Cavity
J2 - Proc. of SRF2017, Lanzhou, China, July 17-21, 2017
C1 - Lanzhou, China
T2 - International Conference on RF Superconductivity
T3 - 18
LA - english
AB - A remote PEALD (Plasma-enhanced Atomic Layer Deposition) system which would offer a high conformality and a low deposition temperature has been being developed for deposition of NbN on an SRF cavity. The deposition equipment consists of a deposition chamber, a remote plasma exciter, a precursor supply system, vacuum pumps, a quartz crystal microbalance (QCM) as a film growth rate meter, a detoxifying system and a safety system. An RF frequency of 13.56MHz was used for the inductively coupled plasma exciter of a reactant gas. The whole equipment is in a draft booth for operation safety. For ALD of an SRF cavity, the ALD system allows us to easily replace the deposition chamber with a single cell Nb cavity. The prepared precursors are tris[ethylmethylamido][tert-butylimido] niobium (TBTEMN) and trimethylaluminium (TMA). Ammonia, hydrogen and water are also prepared as reactants. We will report the ALD system design and result of the NbN deposition on sample coupons which are analysed with SEM, EDX and XPS.
PB - JACoW
CP - Geneva, Switzerland
SP - 870
EP - 872
KW - ion
KW - cavity
KW - niobium
KW - plasma
KW - SRF
DA - 2018/01
PY - 2018
SN - 978-3-95450-191-5
DO - 10.18429/JACoW-SRF2017-THPB055
UR - http://jacow.org/srf2017/papers/thpb055.pdf
ER -