| Paper | Title | Page |
|---|
| TUP64 | Initial Tests of Atomic Layer Deposition (ald) in Superconducting RF Systems | 285 |
| | - M. Pellin, J. Elam, J. Moore, J. Norem
ANL - C. Antoine
CEA-Saclay - L. Cooley
Fermilab - T. Prolier, J. Zasadzinski
IIT - R. Rimmer
JLab
| |
| | Atomic Layer Deposition (ALD) is a method of
synthesizing materials in single atomic layers. We are
studying this technique as a method of producing highly
controlled surfaces for superconducting RF systems. We
have begun tests of ALD coatings of single cells that will
involve RF measurements of a cell before and after
coating at Argonne. In addition to the tests on complete
cells, we are also beginning a program of point contact
tunneling measurements to determine the properties of the
superconductors at the interface between the bulk
niobium and the oxide layer. We describe the method,
and tests we are beginning with single cell resonators and
small samples. | |