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Pechenezhskiy I.

PaperTitlePage
TUP49ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities243
 
  • G. Wu, H. Jiang, T. Khabiboulline, I. Pechenezhskiy, T. Koeth, J. Reid, W. Muranyi, B. Tennis, E. Harms, Y. Terechkine, H. Edwards, D. Mitchell, A. Rowe, C. Boffo, C. Cooper, L. Cooley, R. Schuessler
    Fermilab
  • W. -D. Moeller
    DESY Hamburg
  • C. Antoine
    CEA-Saclay
  • A. Romanenko
    Cornell University
 
 A condition for Electron Cyclotron Resonance (ECR) can be established inside a fully assembled RF cavity without the need for removing high-power couplers. As such, plasma generated by this process can be used as a final cleaning step, or as an alternative cleaning step in place of other techniques. We will describe the current effort to study plasma cleaning by ECR in a 3.9GHz cavity.