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WEPSB42 |
Deposition of Niobium for Superconducting Accelerator on Copper by High Power Impulse Magnetron Sputtering | |
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With the development of RF superconducting accelerator field, research on thin film coated copper cavity becomes increasingly attentive. High Power Impulse Magnetron Sputtering (HiPIMS) is a kind of promising emerging PVD technique in comparison with dc magnetron sputtering already used on thin film coated copper cavities. In this post, the physical properties of niobium films condensed by traditional DC magnetron sputtering (DCMS) and by high power impulse magnetron sputtering (HiPIMS) are evaluated and compared. The DC superconductivity of films with these two techniques is similar and all transition temperature is 9.5 K. Further more, the microstructure of niobium films deposited by HiPIMS at 150 C belong to zone T in contrast to that by DCMS in zone I. From AFM results, the surface roughness by HiPIMS and DCMS is 3.92(±)0.14nm and 6.67(±)0.39nm individually. Adhesion strength is obtained by scratch tests and the films critical load Lc by HiPIMS is 5.53(±)0.93N and that by DCMS is 1.99(±)0.13N.
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