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Watanabe, J.

Paper Title Page
MOPAN041 Design of a Movable Synchrotron Radiation Mask with SiC Absorber for the Photon Factory Advanced Ring (PF-AR) 248
  • T. Takahashi, M. Izawa, S. Sakanaka, K. Umemori
    KEK, Ibaraki
  • H. Suzuki, J. Watanabe
    Toshiba, Yokohama
  We have six rf cavities in the Photon Factory Advanced ring (PF-AR) at KEK. Three years ago, one of them was seriously damaged by the Synchrotron Radiation (SR) from the upstream of the cavity. In order to protect the cavities from SR, we intend to install SR masks nearby the cavities. The masks have to be positioned as close as possible to the beams in order to block the SR completely during the beam storage, and as far as possible during the beam injection. Therefore SR masks should be movable. Since it is placed under strong HOM power from the cavities, careful design is necessary for power dissipation. The basic structure of the movable masks is a coaxial wave-guide with cylindrical SiC absorber whose power capability is designed to be more than 1kW. We report the design of the movable SR masks and the result of rf power test.