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Ike, R.C.

Paper Title Page
TPPT084 Surface Study of Nb/Cu Films for Cavity Deposition by ECR Plasma 4153
 
  • A.T. Wu, R.C. Ike, H.L. Phillips, A-M. Valente, H. Wang, G. Wu
    Jefferson Lab, Newport News, Virginia
 
  Funding: This manuscript has been authorized by SURA, Inc. under Contract No. DE-AC05-84ER-40150 with the U.S. Department of Energy.

Deposition of thin niobium (Nb) films on copper (Cu) cavities, using an electron cyclotron resonance (ECR) plasma appears to be an attractive alternative technique for fabricating superconducting radio frequency cavities to be used in particle accelerators. The performance of these Nb/Cu cavities is expected to depend on the surface characteristics of the Nb films. In this paper, we report on an investigation of the influence of deposition energy on surface morphology, microstructure, and chemical composition of Nb films deposited on small Cu disks employing a metallographic optical microscope, a 3-D profilometer, a scanning electron microscope, and a dynamic secondary ion mass spectrometer. The results will be compared with those obtained on Nb surfaces treated by buffered chemical polishing, electropolishing, and buffered electropolishing. Possible implications from this study for Nb deposition on real Cu cavities will be discussed.