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TY - CONF AU - Persichelli, S. AU - Byrd, J.M. AU - De Santis, S. AU - Li, D. AU - Luo, T.H. AU - Osborn, J.R. AU - Swenson, C.A. AU - Venturini, M. AU - Yang, Y. ED - Schaa, Volker RW ED - Power, Maria ED - Shiltsev, Vladimir ED - White, Marion TI - A Preliminary Beam Impedance Model of the Advanced Light Source Upgrade at LBL J2 - Proc. of NAPAC2016, Chicago, IL, USA, October 9-14, 2016 C1 - Chicago, IL, USA T2 - North American Particle Accelerator Conference T3 - 3 LA - english AB - The proposed upgrade of the Advanced Light Source (ALS-U) consists of a multi-bend achromat ultralow emittance lattice optimized for the production of diffraction-limited soft x-rays. A narrow-aperture vacuum chamber is a key feature of the new generation of light sources, and can result in a significant increase in the beam impedance, potentially limiting the maximum achievable beam current. While the conceptual design of the vacuum system is still in a very early development stage, this paper presents a preliminary estimate of the beam impedance using a combination of electromagnetic simulations and analytical calculations. We include the impedance of cavities, select vacuum-chamber components and resistive wall in a multi-layered beam chamber with NEG coating. PB - JACoW CP - Geneva, Switzerland SP - 1174 EP - 1176 KW - ion KW - impedance KW - cavity KW - vacuum KW - simulation DA - 2017/01 PY - 2017 SN - 978-3-95450-180-9 DO - 10.18429/JACoW-NAPAC2016-THPOA33 UR - https://jacow.org/napac2016/papers/thpoa33.pdf ER -