ShanghaiTech University, Shanghai, People’s Republic of China
The Hard X-ray Ultrafast Spectroscopy Experiment Station (HXS) of the Shanghai high repetition rate XFEL and extreme light facility (SHINE) requires the design and manufacture of a specialized liquid sample injection device when studying the liquid phase state of matter. Due to the damage caused by high-repetition-rate XFEL pulses on the sample, it is necessary to ensure that the liquid sample is refreshed before the next pulse arrives. In order to reduce the impact of liquid film thickness on pump-probe ultrafast spectroscopy experiments, it is required that the liquid film thickness be less than 20 ¿m. This article describes the use of oblique collision of two jets, from simulation calculation to the construction of experimental device, and the use of absorption spectroscopy principle to construct a thickness characterization system. This system can stably produce ultrathin liquid films with thickness ranging from 3-20 ¿m. This article proposes views on the limitations and future improvements of this device.
