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@unpublished{zhu:medsi2023-tupyp024, author = {B.L. Zhu}, title = {{Study of the TiZrV Getter Film Deposited on the Inner Surface of HEPS Undulator Vacuum Tube}}, % booktitle = {Proc. MEDSI'23}, booktitle = {Proc. Int. Conf. Mech. Eng. Design Synchrotron Radiat. Equip. Instrum. (MEDSI'23)}, eventdate = {2023-11-06/2023-11-10}, language = {english}, intype = {presented at the}, series = {International Conference on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation}, number = {12}, venue = {Beijing, China}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {07}, year = {2024}, note = {presented at MEDSI'23 in Beijing, China, unpublished}, abstract = {{The clean and stable ultra-high vacuum environment of the particle accelerator storage ring can reduce the beam loss caused by gas scattering, which is the basis for the long-term stable operation of the beam. The HEPS undulator vacuum system is a very small aperture elliptical pipe with an inner diameter of 22×7 mm. In order to meet the requirements of ultra-high vacuum of the narrow-gap insertion devices vacuum system, a non-evaporable getter (NEG) film is deposited on the inner wall of the tube. In this study, a magnetron sputtering coating system suitable for depositing NEG films on the inner wall of a narrow-gap elliptical pipe was designed and built, and TiZrV films were successfully obtained on the inner wall of an elliptical pipe. The microstructure, deposition rate, crystal structure and chemical composition of TiZrV thin films were studied by scanning electron microscopy, X-ray diffraction and X-ray photoelectron spectroscopy, respectively. The results show that the TiZrV film has a columnar structure and its crystal structure is amorphous. The atomic ratio of the three chemical elements in the TiZrV film is located in the low temperature activation region.}}, }