The non-evaporable getter (NEG) coatings provide conductance-free evenly distributed pumping, low thermal outgassing rates, second electron yield, and photon-and electron-stimulated desorption. NEG coatings are crucial for achieving ultrahigh vacuum in fourth-generation diffraction storage ring vacuum systems. TiZrV thin films were deposited onto elongated CuCrZr pipes for this investigation. The influence of various deposition parameters on the microstructure and vacuum properties of NEG coatings was investigated. The microstructure, surface topography, roughness, and phase composition were evaluated using Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS), Atomic Force Microscope (AFM), and X-ray Diffraction (XRD), respectively. Furthermore, the activation performance of the TiZrV films was investigated in relation to deposition parameters.