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RIS citation export for WEPOMS025: Injector Design Towards ERL-Based EUV-FEL for Lithography

TY  - CONF
AU  - Tanaka, O.A.
AU  - Miyajima, T.
AU  - Nakamura, N.
AU  - Tanikawa, T.
ED  - Zimmermann, Frank
ED  - Tanaka, Hitoshi
ED  - Sudmuang, Porntip
ED  - Klysubun, Prapong
ED  - Sunwong, Prapaiwan
ED  - Chanwattana, Thakonwat
ED  - Petit-Jean-Genaz, Christine
ED  - Schaa, Volker R.W.
TI  - Injector Design Towards ERL-Based EUV-FEL for Lithography
J2  - Proc. of IPAC2022, Bangkok, Thailand, 12-17 June 2022
CY  - Bangkok, Thailand
T2  - International Particle Accelerator Conference
T3  - 13
LA  - english
AB  - A high-power EUV light source using ERL-based FEL can supply multiple semiconductor exposure de-vices. There are some requirements in the whole and its injector, in particular, and their examination and necessary development are being carried out. The requirement for the injector was to generate high bunch charge beams at a high-repetition rate. In this regard, a space charge effect should be treated carefully in the design of the injector. For FEL operation, not only short bunch length and small transverse emittance but also small longitudinal emittance are required. By using a multi-objective genetic algorithm, we are minimizing them at the exit of the injector to investigate the injector performance and its effect on the FEL generation. In this study, we describe the injector optimization strategies and possible options suited for the ERL-based EUV-FEL.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 2299
EP  - 2302
KW  - emittance
KW  - cavity
KW  - electron
KW  - FEL
KW  - solenoid
DA  - 2022/07
PY  - 2022
SN  - 2673-5490
SN  - 978-3-95450-227-1
DO  - doi:10.18429/JACoW-IPAC2022-WEPOMS025
UR  - https://jacow.org/ipac2022/papers/wepoms025.pdf
ER  -