JACoW is a publisher in Geneva, Switzerland that publishes the proceedings of accelerator conferences held around the world by an international collaboration of editors.
@inproceedings{tanaka:ipac2022-wepoms025,
author = {O.A. Tanaka and T. Miyajima and N. Nakamura and T. Tanikawa},
title = {{Injector Design Towards ERL-Based EUV-FEL for Lithography}},
booktitle = {Proc. IPAC'22},
% booktitle = {Proc. 13th International Particle Accelerator Conference (IPAC'22)},
pages = {2299--2302},
eid = {WEPOMS025},
language = {english},
keywords = {emittance, cavity, electron, FEL, solenoid},
venue = {Bangkok, Thailand},
series = {International Particle Accelerator Conference},
number = {13},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {07},
year = {2022},
issn = {2673-5490},
isbn = {978-3-95450-227-1},
doi = {10.18429/JACoW-IPAC2022-WEPOMS025},
url = {https://jacow.org/ipac2022/papers/wepoms025.pdf},
abstract = {{A high-power EUV light source using ERL-based FEL can supply multiple semiconductor exposure de-vices. There are some requirements in the whole and its injector, in particular, and their examination and necessary development are being carried out. The requirement for the injector was to generate high bunch charge beams at a high-repetition rate. In this regard, a space charge effect should be treated carefully in the design of the injector. For FEL operation, not only short bunch length and small transverse emittance but also small longitudinal emittance are required. By using a multi-objective genetic algorithm, we are minimizing them at the exit of the injector to investigate the injector performance and its effect on the FEL generation. In this study, we describe the injector optimization strategies and possible options suited for the ERL-based EUV-FEL.}},
}