Author: Craievich, P.
Paper Title Page
WEPAB015 Comparison of Different Matching Device Field Profiles for the FCC-ee Positron Source 2617
  • Y. Zhao, L. Ma
    SDU, Shandong, People’s Republic of China
  • B. Auchmann, P. Craievich, J. Kosse, R. Zennaro
    PSI, Villigen PSI, Switzerland
  • I. Chaikovska, R. Chehab
    Université Paris-Saclay, CNRS/IN2P3, IJCLab, Orsay, France
  • S. Döbert, A. Latina
    CERN, Geneva, Switzerland
  • P.V. Martyshkin
    BINP SB RAS, Novosibirsk, Russia
  In this report, we compared different matching device field profiles for the FCC-ee positron source. The matching device is used to capture positrons with magnetic field. A flux concentrator was designed with a conical inner chamber. A smaller aperture and a larger aperture were studied. An analytic field profile was also studied using an adiabatic formula. The peak field of the analytic profile as well as beam and target parameters was optimised to achieve a maximum positron yield. A safe energy deposition in the target was guaranteed by requiring a constraint on the deposited power and peak energy deposition density.  
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About • paper received ※ 15 May 2021       paper accepted ※ 23 June 2021       issue date ※ 30 August 2021  
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