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@inproceedings{houlahan:ipac2021-wepab390,
author = {T.J. Houlahan and I. Haehnlein and W.M. Huber and B.E. Jurczyk and I.A. Shchelkanov and R.A. Stubbers},
title = {{High-Quality, Conformal Bellows Coatings Using Ultra-Fast HiPIMS with Precision Ion Energy Control}},
booktitle = {Proc. IPAC'21},
pages = {3626--3629},
eid = {WEPAB390},
language = {english},
keywords = {plasma, vacuum, target, operation, experiment},
venue = {Campinas, SP, Brazil},
series = {International Particle Accelerator Conference},
number = {12},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {08},
year = {2021},
issn = {2673-5490},
isbn = {978-3-95450-214-1},
doi = {10.18429/JACoW-IPAC2021-WEPAB390},
url = {https://jacow.org/ipac2021/papers/wepab390.pdf},
note = {https://doi.org/10.18429/JACoW-IPAC2021-WEPAB390},
abstract = {{In this paper we demonstrate a replacement for traditional ’wet’ chemical deposition processes using a vacuum, ionized physical vapor deposition (iPVD) process that results in a conformal metal film, capable of coating complex, convoluted parts that are common in modern particle accelerators (e.g., bellows, RF cavities). Results are presented for a process utilizing the combined deposition and etching that are achieved using ultra-fast high-power impulse magnetron sputtering (HiPIMS) coupled with precision control of the ion energy using a positive voltage reversal. This process results in a conformal film and has been used to coat both test coupons and full bellows assemblies. The resulting Cu films, which are 5-10 µm in thickness, exhibit excellent adhesion. Further, they have been shown to tolerate temperature extremes ranging from 77 K to a 400 C vacuum bakeout as well as extreme plastic deformation of the substrate without any buckling, cracking, or delamination.}},
}