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RIS citation export for WEPAB222: Impedance Evaluation of Masks in the HEPS Storage Ring

TY  - CONF
AU  - Wang, N.
AU  - Tian, S.K.
AU  - Wang, J.Q.
ED  - Liu, Lin
ED  - Byrd, John M.
ED  - Neuenschwander, Regis T.
ED  - Picoreti, Renan
ED  - Schaa, Volker R. W.
TI  - Impedance Evaluation of Masks in the HEPS Storage Ring
J2  - Proc. of IPAC2021, Campinas, SP, Brazil, 24-28 May 2021
CY  - Campinas, SP, Brazil
T2  - International Particle Accelerator Conference
T3  - 12
LA  - english
AB  - Masks are commonly used in photon light sources to protect sensitive elements from synchrotron radiations. In the ultra-low emittance rings, small aperture vacuum chambers are adopted in order to reach the very high gradient in the quadrupoles, while many masks are required due to the high radiation power density. Therefore, the impedance of the masks becomes one of the dominant contributors to the impedance budget. In this paper, the impedance is evaluated among different mask designs. Meanwhile, the impedance cross-talk between adjacent masks is discussed.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 3145
EP  - 3148
KW  - impedance
KW  - resonance
KW  - wakefield
KW  - radiation
KW  - synchrotron
DA  - 2021/08
PY  - 2021
SN  - 2673-5490
SN  - 978-3-95450-214-1
DO  - doi:10.18429/JACoW-IPAC2021-WEPAB222
UR  - https://jacow.org/ipac2021/papers/wepab222.pdf
ER  -