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@inproceedings{wang:ipac2021-wepab222,
author = {N. Wang and S.K. Tian and J.Q. Wang},
title = {{Impedance Evaluation of Masks in the HEPS Storage Ring}},
booktitle = {Proc. IPAC'21},
pages = {3145--3148},
eid = {WEPAB222},
language = {english},
keywords = {impedance, resonance, wakefield, radiation, synchrotron},
venue = {Campinas, SP, Brazil},
series = {International Particle Accelerator Conference},
number = {12},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {08},
year = {2021},
issn = {2673-5490},
isbn = {978-3-95450-214-1},
doi = {10.18429/JACoW-IPAC2021-WEPAB222},
url = {https://jacow.org/ipac2021/papers/wepab222.pdf},
note = {https://doi.org/10.18429/JACoW-IPAC2021-WEPAB222},
abstract = {{Masks are commonly used in photon light sources to protect sensitive elements from synchrotron radiations. In the ultra-low emittance rings, small aperture vacuum chambers are adopted in order to reach the very high gradient in the quadrupoles, while many masks are required due to the high radiation power density. Therefore, the impedance of the masks becomes one of the dominant contributors to the impedance budget. In this paper, the impedance is evaluated among different mask designs. Meanwhile, the impedance cross-talk between adjacent masks is discussed.}},
}