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RIS citation export for WEPAB109: Initial Study of GaN Thin Films for Photocathodes Prepared by Magnetron Sputtering on Copper Substrates

TY  - CONF
AU  - Vogel, M.
AU  - Jiang, X.
AU  - Murcek, P.
AU  - Schaber, J.
AU  - Wang, C.
AU  - Xiang, R.
ED  - Liu, Lin
ED  - Byrd, John M.
ED  - Neuenschwander, Regis T.
ED  - Picoreti, Renan
ED  - Schaa, Volker R. W.
TI  - Initial Study of GaN Thin Films for Photocathodes Prepared by Magnetron Sputtering on Copper Substrates
J2  - Proc. of IPAC2021, Campinas, SP, Brazil, 24-28 May 2021
CY  - Campinas, SP, Brazil
T2  - International Particle Accelerator Conference
T3  - 12
LA  - english
AB  - On the path for high brightness electron beams, Gallium Nitride (GaN) is one promising candidate for a photo-cathode material. In this contribution, we report on the continuation of the study to optimize the crystallization quality and crystallography of Mg-doped GaN samples on copper substrates that are synthesized by RF magnetron sputtering. SEM and XRD results show that the pretreatment methods and the sputtering conditions (temperature, sputtering power, and partial pressure of the reactive gas) can both affect the morphology and crystal quality of GaN films. The initial QE measurements of these samples are done in our newly build in-situ QE measurement system and the first results of QE analyses done at Helmholtz-Zentrum Dresden-Rossendorf (HZDR) are presented in a dedicated contribution.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 2850
EP  - 2852
KW  - cathode
KW  - electron
KW  - plasma
KW  - gun
KW  - experiment
DA  - 2021/08
PY  - 2021
SN  - 2673-5490
SN  - 978-3-95450-214-1
DO  - doi:10.18429/JACoW-IPAC2021-WEPAB109
UR  - https://jacow.org/ipac2021/papers/wepab109.pdf
ER  -