Title |
Comparison of Different Matching Device Field Profiles for the FCC-ee Positron Source |
Authors |
- Y. Zhao, L. Ma
SDU, Shandong, People’s Republic of China
- B. Auchmann, P. Craievich, J. Kosse, R. Zennaro
PSI, Villigen PSI, Switzerland
- I. Chaikovska, R. Chehab
Université Paris-Saclay, CNRS/IN2P3, IJCLab, Orsay, France
- S. Döbert, A. Latina
CERN, Meyrin, Switzerland
- P.V. Martyshkin
BINP SB RAS, Novosibirsk, Russia
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Abstract |
In this report, we compared different matching device field profiles for the FCC-ee positron source. The matching device is used to capture positrons with magnetic field. A flux concentrator was designed with a conical inner chamber. A smaller aperture and a larger aperture were studied. An analytic field profile was also studied using an adiabatic formula. The peak field of the analytic profile as well as beam and target parameters was optimised to achieve a maximum positron yield. A safe energy deposition in the target was guaranteed by requiring a constraint on the deposited power and peak energy deposition density.
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Paper |
download WEPAB015.PDF [1.232 MB / 4 pages] |
Poster |
download WEPAB015_POSTER.PDF [3.066 MB] |
Export |
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Conference |
IPAC2021 |
Series |
International Particle Accelerator Conference (12th) |
Location |
Campinas, SP, Brazil |
Date |
24-28 May 2021 |
Publisher |
JACoW Publishing, Geneva, Switzerland |
Editorial Board |
Liu Lin (LNLS, Campinas, Brazil); John M. Byrd (ANL, Lemont, IL, USA); Regis Neuenschwander (LNLS, Campinas, Brazil); Renan Picoreti (LNLS, Campinas, Brazil); Volker R. W. Schaa (GSI, Darmstadt, Germany) |
Online ISBN |
978-3-95450-214-1 |
Online ISSN |
2673-5490 |
Received |
15 May 2021 |
Accepted |
23 June 2021 |
Issue Date |
30 August 2021 |
DOI |
doi:10.18429/JACoW-IPAC2021-WEPAB015 |
Pages |
2617-2620 |
Copyright |
Published by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI. |
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