IPAC2019 - List of Authors (Zhu, B.L.)

Paper	Title	Page
TUPMP029	Establishing a Laser Treatment to Suppress the Secondary Electron Emission	1303
SUSPFO071	use link to see paper's listing under its alternate paper code
	Y.G. Wang, X.Q. Ge, X.T. Pei, S.W. Wang, Y. Wang, B. Zhang, B.L. Zhu USTC/NSRL, Hefei, Anhui, People’s Republic of China
	Laser treatment has a significant inluent on suppressing the secondary electron emission(SEE). The new synchrotron radiation light source, the Hefei Advanced Light Source(HALS) has a strict requirement on the SEE. In this paper, we used a 355nm laser to process copper sample. After the laser treatment, the secondary electron yield(SEY) reduced from 2.05 to 0.86. We used the scanning electron microscope(SEM) to analysis the surface of sample after the laser treatment.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-TUPMP029
About •	paper received ※ 30 April 2019 paper accepted ※ 22 May 2019 issue date ※ 21 June 2019
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TUPMP031	Research on Secondary Electron Emission Characteristics of Diamond-like Carbon Thin Films	1306
SUSPFO081	use link to see paper's listing under its alternate paper code
	Y.X. Zhang, X.Q. Ge, W. Li, J.Q. Shao, S. Wang, Y.G. Wang, Y. Wang, W. Wei, B. Zhang, B.L. Zhu USTC/NSRL, Hefei, Anhui, People’s Republic of China
	In modern particle accelerators, the build-up of electron cloud is a main limiting factor for the achievement of high-quality beam. Among the techniques to mitigate it, coating the internal walls of the beam pipes with a thin film which has a low secondary electron yield (SEY) is considered to be one of the most effective means. From several earlier studies, it was found that diamond-like carbon (DLC) thin films are potential coatings. This paper is mainly about the research on secondary electron emission characteristics of DLC thin films. The secondary electron emission (SEE) tests were done at temperature of 298 K and vacuum pressure of 2×10^-9 Torr. Here, we obtained the characteristics of the SEE from DLC film coatings with different thickness under ultrahigh-vacuum (UHV) conditions. The maximum secondary electron yield (SEY), δmax, of the DLC thin films under different primary electron doses were also obtained, respectively.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-TUPMP031
About •	paper received ※ 26 April 2019 paper accepted ※ 22 May 2019 issue date ※ 21 June 2019
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPTS045	Preparation of Titanum-Zirconium-Vanadium Films by Quantitative Deposition	4210
	J.Q. Shao, C. Chen, X.Q. Ge, W. Li, S. Wang, Y. Wang, W. Wei, B. Zhang, Y.X. Zhang, B.L. Zhu USTC/NSRL, Hefei, Anhui, People’s Republic of China
	TiZrV has been used in vacuum technology and electric vacuum devices due to its high pumping speed and low activation temperature in recent years. At the same time, many preparation methods have been developed. Different from the current coating method of magnetron sputtering, this paper discusses the preparation of thin film coating from the viewpoint of vacuum sintering, which is flexible in design and more suitable for operation. Based on the analysis of the surface morphology of the sintered film, the feasibility and operability of the experimental method were explored from the surface compactness of the getter.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-THPTS045
About •	paper received ※ 25 April 2019 paper accepted ※ 22 May 2019 issue date ※ 21 June 2019
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

TUPMP029

Establishing a Laser Treatment to Suppress the Secondary Electron Emission

1303

SUSPFO071

use link to see paper's listing under its alternate paper code

Y.G. Wang, X.Q. Ge, X.T. Pei, S.W. Wang, Y. Wang, B. Zhang, B.L. Zhu
USTC/NSRL, Hefei, Anhui, People’s Republic of China

Laser treatment has a significant inluent on suppressing the secondary electron emission(SEE). The new synchrotron radiation light source, the Hefei Advanced Light Source(HALS) has a strict requirement on the SEE. In this paper, we used a 355nm laser to process copper sample. After the laser treatment, the secondary electron yield(SEY) reduced from 2.05 to 0.86. We used the scanning electron microscope(SEM) to analysis the surface of sample after the laser treatment.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-TUPMP029

About •

paper received ※ 30 April 2019 paper accepted ※ 22 May 2019 issue date ※ 21 June 2019

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPMP031

Research on Secondary Electron Emission Characteristics of Diamond-like Carbon Thin Films

1306

SUSPFO081

use link to see paper's listing under its alternate paper code

Y.X. Zhang, X.Q. Ge, W. Li, J.Q. Shao, S. Wang, Y.G. Wang, Y. Wang, W. Wei, B. Zhang, B.L. Zhu
USTC/NSRL, Hefei, Anhui, People’s Republic of China

In modern particle accelerators, the build-up of electron cloud is a main limiting factor for the achievement of high-quality beam. Among the techniques to mitigate it, coating the internal walls of the beam pipes with a thin film which has a low secondary electron yield (SEY) is considered to be one of the most effective means. From several earlier studies, it was found that diamond-like carbon (DLC) thin films are potential coatings. This paper is mainly about the research on secondary electron emission characteristics of DLC thin films. The secondary electron emission (SEE) tests were done at temperature of 298 K and vacuum pressure of 2×10^-9 Torr. Here, we obtained the characteristics of the SEE from DLC film coatings with different thickness under ultrahigh-vacuum (UHV) conditions. The maximum secondary electron yield (SEY), δmax, of the DLC thin films under different primary electron doses were also obtained, respectively.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-TUPMP031

About •

paper received ※ 26 April 2019 paper accepted ※ 22 May 2019 issue date ※ 21 June 2019

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPTS045

Preparation of Titanum-Zirconium-Vanadium Films by Quantitative Deposition

4210

J.Q. Shao, C. Chen, X.Q. Ge, W. Li, S. Wang, Y. Wang, W. Wei, B. Zhang, Y.X. Zhang, B.L. Zhu
USTC/NSRL, Hefei, Anhui, People’s Republic of China

TiZrV has been used in vacuum technology and electric vacuum devices due to its high pumping speed and low activation temperature in recent years. At the same time, many preparation methods have been developed. Different from the current coating method of magnetron sputtering, this paper discusses the preparation of thin film coating from the viewpoint of vacuum sintering, which is flexible in design and more suitable for operation. Based on the analysis of the surface morphology of the sintered film, the feasibility and operability of the experimental method were explored from the surface compactness of the getter.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-THPTS045

About •

paper received ※ 25 April 2019 paper accepted ※ 22 May 2019 issue date ※ 21 June 2019

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)