Author: Zhang, Y.X.
Paper Title Page
TUPMP021 Comparison of TiZrV Non-evaporable Getter Films Deposited by DC Magnetron Sputtering or Quantitative Deposition 1283
SUSPFO057   use link to see paper's listing under its alternate paper code  
 
  • X.Q. Ge, W. Li, J.Q. Shao, S. Wang, Y.G. Wang, Y. Wang, W. Wei, B. Zhang, Y.X. Zhang
    USTC/NSRL, Hefei, Anhui, People’s Republic of China
 
  Ti-Zr-V non-evaporable getter (NEG) films have been widely used in vacuum chambers of various accelerators since their discovery. Recently, we have used a new method called ’quantitative deposition’ to deposit Ti-Zr-V NEG films on nichrome substrates. The surface morphology and surface chemical bonding information were collected by scanning electron microscopy. Although the film deposited by DC magnetron sputtering has more uniform grain growth, smoother grain boundaries and higher porosity, the two films all have porous network structure and can be used as getter films.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-TUPMP021  
About • paper received ※ 24 April 2019       paper accepted ※ 23 May 2019       issue date ※ 21 June 2019  
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TUPMP031 Research on Secondary Electron Emission Characteristics of Diamond-like Carbon Thin Films 1306
SUSPFO081   use link to see paper's listing under its alternate paper code  
 
  • Y.X. Zhang, X.Q. Ge, W. Li, J.Q. Shao, S. Wang, Y.G. Wang, Y. Wang, W. Wei, B. Zhang, B.L. Zhu
    USTC/NSRL, Hefei, Anhui, People’s Republic of China
 
  In modern particle accelerators, the build-up of electron cloud is a main limiting factor for the achievement of high-quality beam. Among the techniques to mitigate it, coating the internal walls of the beam pipes with a thin film which has a low secondary electron yield (SEY) is considered to be one of the most effective means. From several earlier studies, it was found that diamond-like carbon (DLC) thin films are potential coatings. This paper is mainly about the research on secondary electron emission characteristics of DLC thin films. The secondary electron emission (SEE) tests were done at temperature of 298 K and vacuum pressure of 2×10-9 Torr. Here, we obtained the characteristics of the SEE from DLC film coatings with different thickness under ultrahigh-vacuum (UHV) conditions. The maximum secondary electron yield (SEY), δmax, of the DLC thin films under different primary electron doses were also obtained, respectively.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-TUPMP031  
About • paper received ※ 26 April 2019       paper accepted ※ 22 May 2019       issue date ※ 21 June 2019  
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THPTS045 Preparation of Titanum-Zirconium-Vanadium Films by Quantitative Deposition 4210
 
  • J.Q. Shao, C. Chen, X.Q. Ge, W. Li, S. Wang, Y. Wang, W. Wei, B. Zhang, Y.X. Zhang, B.L. Zhu
    USTC/NSRL, Hefei, Anhui, People’s Republic of China
 
  TiZrV has been used in vacuum technology and electric vacuum devices due to its high pumping speed and low activation temperature in recent years. At the same time, many preparation methods have been developed. Different from the current coating method of magnetron sputtering, this paper discusses the preparation of thin film coating from the viewpoint of vacuum sintering, which is flexible in design and more suitable for operation. Based on the analysis of the surface morphology of the sintered film, the feasibility and operability of the experimental method were explored from the surface compactness of the getter.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-THPTS045  
About • paper received ※ 25 April 2019       paper accepted ※ 22 May 2019       issue date ※ 21 June 2019  
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