IPAC2019 - List of Authors (Yang, Y.T.)

Paper	Title	Page
MOPGW054	Study on Spherical Aberration Correction of Solenoid Lens in Ultrafast Electron Diffraction	213
	Y.T. Yang, K. Fan, J.J. Li HUST, Wuhan, People’s Republic of China Y. Song Huazhong University of Science and Technology, State Key Laboratory of Advanced Electromagnetic Engineering and Technology,, Hubei, People’s Republic of China
	High electron beam quality is required in Ultrafast Electron Diffraction (UED) to achieve high spatial resolution. However, aberrations mainly induced by solenoid lens will deteriorate the beam quality and limit the resolution. Spherical aberration introduces the largest distortion which is unavoidable in the case of static cylindrically symmetric electromagnetic fields on the basis of Scherzer’s theorem. In order to reduce the spherical aberrations, different models have been designed which are composed of three symmetrical lens and one asymmetrical lens. We obtain the magnetic field distribution and calculate the aberration of each model by OPERA, and the result is that the solenoid without poles has the minimum aberration and meets the design requirement best.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-MOPGW054
About •	paper received ※ 13 May 2019 paper accepted ※ 17 May 2019 issue date ※ 21 June 2019
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPTS047	Improvement of 6D Brightness by a 1.4-cell Photocathode RF Gun for MeV Ultrafast Electron Diffraction	2033
SUSPFO069	use link to see paper's listing under its alternate paper code
	Y. Song Huazhong University of Science and Technology, State Key Laboratory of Advanced Electromagnetic Engineering and Technology,, Hubei, People’s Republic of China K. Fan, C.-Y. Tsai, Y.T. Yang HUST, Wuhan, People’s Republic of China J. Yang ISIR, Osaka, Japan
	Recent research indicates that ultrafast electron diffraction and microscopy (UED/M) have unprecedented potential in probing ultrafast dynamic processes, especially in organic and biological materials. However, reaching the required brightness while maintaining high spatiotemporal resolution requires new design of electron source. In order to produce ultrashort electron beam with extreme high brightness, a 1.4-cell RF gun is being developed to reach higher acceleration gradient near the photocathode and thus suppress the space charge effect in the low energy region. Simulation of the 1.4-cell RF photocathode gun shows considerable improvement in bunch length, emittance and energy spread, which all lead to better temporal and spatial resolution comparing to traditional 1.6-cell RF photocathode gun. The results demonstrate the feasibility of sub-ps temporal resolution with normalized emittance less than 0.1 πmm·mrad while maintaining 1 pC electron pulse.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-TUPTS047
About •	paper received ※ 24 April 2019 paper accepted ※ 21 May 2019 issue date ※ 21 June 2019
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPGW043	Conceptual design of a MeV Ultrafast Electron Diffraction Based on 1.4 Cell RF Gun	3679
SUSPFO061	use link to see paper's listing under its alternate paper code
	J.J. Li, H.M. Chen, K. Fan, Y. Song, P. Yang, Y.T. Yang HUST, Wuhan, People’s Republic of China
	Ultrafast Electron Diffraction (UED) is a powerful tool to investigate the dynamic structure with temporal scale of 100 femtoseconds and spatial scale of atomic length. To achieve high quality diffraction patterns, the transverse emittance and the longitudinal length of electron bunches should be reduced. MeV UED, using photocath-ode RF gun instead of traditional DC gun, is being developed to produce high quality electron bunches with lower emittance and shorter length. We are developing a MeV UED facility based on a 1.4 cell photocathode RF gun that can provide higher acceleration gradient at Huazhong University of Science and Technology. In this paper, the conceptual design of the MeV UED is pro-posed with typical parameters of the system, as well as the ASTRA simulation results of optimization.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-THPGW043
About •	paper received ※ 11 May 2019 paper accepted ※ 21 May 2019 issue date ※ 21 June 2019
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

Study on Spherical Aberration Correction of Solenoid Lens in Ultrafast Electron Diffraction

213

Y.T. Yang, K. Fan, J.J. Li
HUST, Wuhan, People’s Republic of China
Y. Song
Huazhong University of Science and Technology, State Key Laboratory of Advanced Electromagnetic Engineering and Technology,, Hubei, People’s Republic of China

High electron beam quality is required in Ultrafast Electron Diffraction (UED) to achieve high spatial resolution. However, aberrations mainly induced by solenoid lens will deteriorate the beam quality and limit the resolution. Spherical aberration introduces the largest distortion which is unavoidable in the case of static cylindrically symmetric electromagnetic fields on the basis of Scherzer’s theorem. In order to reduce the spherical aberrations, different models have been designed which are composed of three symmetrical lens and one asymmetrical lens. We obtain the magnetic field distribution and calculate the aberration of each model by OPERA, and the result is that the solenoid without poles has the minimum aberration and meets the design requirement best.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-MOPGW054

About •

paper received ※ 13 May 2019 paper accepted ※ 17 May 2019 issue date ※ 21 June 2019

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

TUPTS047

Improvement of 6D Brightness by a 1.4-cell Photocathode RF Gun for MeV Ultrafast Electron Diffraction

2033

SUSPFO069

use link to see paper's listing under its alternate paper code

Y. Song
Huazhong University of Science and Technology, State Key Laboratory of Advanced Electromagnetic Engineering and Technology,, Hubei, People’s Republic of China
K. Fan, C.-Y. Tsai, Y.T. Yang
HUST, Wuhan, People’s Republic of China
J. Yang
ISIR, Osaka, Japan

Recent research indicates that ultrafast electron diffraction and microscopy (UED/M) have unprecedented potential in probing ultrafast dynamic processes, especially in organic and biological materials. However, reaching the required brightness while maintaining high spatiotemporal resolution requires new design of electron source. In order to produce ultrashort electron beam with extreme high brightness, a 1.4-cell RF gun is being developed to reach higher acceleration gradient near the photocathode and thus suppress the space charge effect in the low energy region. Simulation of the 1.4-cell RF photocathode gun shows considerable improvement in bunch length, emittance and energy spread, which all lead to better temporal and spatial resolution comparing to traditional 1.6-cell RF photocathode gun. The results demonstrate the feasibility of sub-ps temporal resolution with normalized emittance less than 0.1 πmm·mrad while maintaining 1 pC electron pulse.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-TUPTS047

About •

paper received ※ 24 April 2019 paper accepted ※ 21 May 2019 issue date ※ 21 June 2019

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPGW043

Conceptual design of a MeV Ultrafast Electron Diffraction Based on 1.4 Cell RF Gun

3679

SUSPFO061

use link to see paper's listing under its alternate paper code

J.J. Li, H.M. Chen, K. Fan, Y. Song, P. Yang, Y.T. Yang
HUST, Wuhan, People’s Republic of China

Ultrafast Electron Diffraction (UED) is a powerful tool to investigate the dynamic structure with temporal scale of 100 femtoseconds and spatial scale of atomic length. To achieve high quality diffraction patterns, the transverse emittance and the longitudinal length of electron bunches should be reduced. MeV UED, using photocath-ode RF gun instead of traditional DC gun, is being developed to produce high quality electron bunches with lower emittance and shorter length. We are developing a MeV UED facility based on a 1.4 cell photocathode RF gun that can provide higher acceleration gradient at Huazhong University of Science and Technology. In this paper, the conceptual design of the MeV UED is pro-posed with typical parameters of the system, as well as the ASTRA simulation results of optimization.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-THPGW043

About •

paper received ※ 11 May 2019 paper accepted ※ 21 May 2019 issue date ※ 21 June 2019

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)