Paper |
Title |
Page |
TUPMP021 |
Comparison of TiZrV Non-evaporable Getter Films Deposited by DC Magnetron Sputtering or Quantitative Deposition |
1283 |
SUSPFO057 |
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- X.Q. Ge, W. Li, J.Q. Shao, S. Wang, Y.G. Wang, Y. Wang, W. Wei, B. Zhang, Y.X. Zhang
USTC/NSRL, Hefei, Anhui, People’s Republic of China
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Ti-Zr-V non-evaporable getter (NEG) films have been widely used in vacuum chambers of various accelerators since their discovery. Recently, we have used a new method called ’quantitative deposition’ to deposit Ti-Zr-V NEG films on nichrome substrates. The surface morphology and surface chemical bonding information were collected by scanning electron microscopy. Although the film deposited by DC magnetron sputtering has more uniform grain growth, smoother grain boundaries and higher porosity, the two films all have porous network structure and can be used as getter films.
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DOI • |
reference for this paper
※ https://doi.org/10.18429/JACoW-IPAC2019-TUPMP021
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About • |
paper received ※ 24 April 2019 paper accepted ※ 23 May 2019 issue date ※ 21 June 2019 |
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TUPMP031 |
Research on Secondary Electron Emission Characteristics of Diamond-like Carbon Thin Films |
1306 |
SUSPFO081 |
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- Y.X. Zhang, X.Q. Ge, W. Li, J.Q. Shao, S. Wang, Y.G. Wang, Y. Wang, W. Wei, B. Zhang, B.L. Zhu
USTC/NSRL, Hefei, Anhui, People’s Republic of China
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In modern particle accelerators, the build-up of electron cloud is a main limiting factor for the achievement of high-quality beam. Among the techniques to mitigate it, coating the internal walls of the beam pipes with a thin film which has a low secondary electron yield (SEY) is considered to be one of the most effective means. From several earlier studies, it was found that diamond-like carbon (DLC) thin films are potential coatings. This paper is mainly about the research on secondary electron emission characteristics of DLC thin films. The secondary electron emission (SEE) tests were done at temperature of 298 K and vacuum pressure of 2×10-9 Torr. Here, we obtained the characteristics of the SEE from DLC film coatings with different thickness under ultrahigh-vacuum (UHV) conditions. The maximum secondary electron yield (SEY), δmax, of the DLC thin films under different primary electron doses were also obtained, respectively.
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DOI • |
reference for this paper
※ https://doi.org/10.18429/JACoW-IPAC2019-TUPMP031
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About • |
paper received ※ 26 April 2019 paper accepted ※ 22 May 2019 issue date ※ 21 June 2019 |
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TUPTS046 |
Commissioning of a Compact THz Source Based on FEL |
2030 |
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- Y.J. Pei, G. Feng, X.Y. He, Y. Hong, D. Jia, P. Lu, S. Lu, L. Shang, B.G. Sun, Zh.X. Tang, W. Wang, X.Q. Wang, W. Wei
USTC/NSRL, Hefei, Anhui, People’s Republic of China
- L. Cao, Q.S. Chen, Q. Fu, T. Hu, P. Tan, Y.Q. Xiong
HUST, Wuhan, People’s Republic of China
- G. Huang
IMP/CAS, Lanzhou, People’s Republic of China
- L.G. Shen, F. Zhang
USTC/PMPI, Hefei, Anhui, People’s Republic of China
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The layout of the THz source based on FEL was de-scribed in this paper. The THz source was based on a FEL which was composed of a compact 8-14MeV LINAC, undulator, optical resonance, THz wave measurement system and so on. The facility was designed in 2013 and the typical running parameter got in 2017 were as the following: energy is of 12.7MeV, energy spread is of 0.3%, macro-pulse is of 4 μs, pulse length of micro-pulse is of 6ps, emittance is of 24 mm.mrad. After that the ma-chine was commissioning for production THz radiation. In November 2018, the THz wave was test and got THz wave signal, the spectrum was also got. This year, we plan to measure the output power of the THz source.
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DOI • |
reference for this paper
※ https://doi.org/10.18429/JACoW-IPAC2019-TUPTS046
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About • |
paper received ※ 15 May 2019 paper accepted ※ 21 May 2019 issue date ※ 21 June 2019 |
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THPTS045 |
Preparation of Titanum-Zirconium-Vanadium Films by Quantitative Deposition |
4210 |
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- J.Q. Shao, C. Chen, X.Q. Ge, W. Li, S. Wang, Y. Wang, W. Wei, B. Zhang, Y.X. Zhang, B.L. Zhu
USTC/NSRL, Hefei, Anhui, People’s Republic of China
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TiZrV has been used in vacuum technology and electric vacuum devices due to its high pumping speed and low activation temperature in recent years. At the same time, many preparation methods have been developed. Different from the current coating method of magnetron sputtering, this paper discusses the preparation of thin film coating from the viewpoint of vacuum sintering, which is flexible in design and more suitable for operation. Based on the analysis of the surface morphology of the sintered film, the feasibility and operability of the experimental method were explored from the surface compactness of the getter.
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DOI • |
reference for this paper
※ https://doi.org/10.18429/JACoW-IPAC2019-THPTS045
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About • |
paper received ※ 25 April 2019 paper accepted ※ 22 May 2019 issue date ※ 21 June 2019 |
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