IPAC2019 - List of Authors (Nakamura, T.)

Paper	Title	Page
THPTS026	Effect of Nitric Hydrofluoric Acid Treatment on Brazing of Alumina Ceramics and Pure Titanium	4161
	M. Kinsho, J. Kamiya JAEA/J-PARC, Tokai-mura, Japan K. Abe Hitachi Power Semiconductor Device, Ltd., Hitachishi, Ibaraki, Japan T. Nakamura Asahi Kinzoku Co., Ltd., Gifu, Japan
	Alumina ceramics vacuum chamber which is used for the 3GeV rapid-cycling synchrotron (RCS) in J-PARC is composed of alumina duct, titanium (Ti) flanges and Ti sleeves. Before brazing the alumina duct and the Ti sleeves, the Ti sleeves were treated with nitric hydrofluoric acid. The purpose of this study is to clear the effect of this treatment for titanium material. It was cleared by SEM observation that the roughness of the titanium material after the nitric hydrofluoric acid treatment becomes big. It was also measured that the thickness of oxide film on surface of the titanium material was 12.7 nm before treatment and 6.0 nm after treatment. As a result of measuring the wettability of the brazing material which was silver brazing filler metal (Ag: 72%, Cu: 28%) on the Ti surface and the diffusion of the Ti material into the brazing material, it became clear that both the clearing of oxide layer on the alumina ceramics and the vacuum condition of the vacuum heating furnace were important for brazing between alumina ceramics and pure titanium.
DOI •	reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-THPTS026
About •	paper received ※ 14 May 2019 paper accepted ※ 23 May 2019 issue date ※ 21 June 2019
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

Effect of Nitric Hydrofluoric Acid Treatment on Brazing of Alumina Ceramics and Pure Titanium

4161

M. Kinsho, J. Kamiya
JAEA/J-PARC, Tokai-mura, Japan
K. Abe
Hitachi Power Semiconductor Device, Ltd., Hitachishi, Ibaraki, Japan
T. Nakamura
Asahi Kinzoku Co., Ltd., Gifu, Japan

Alumina ceramics vacuum chamber which is used for the 3GeV rapid-cycling synchrotron (RCS) in J-PARC is composed of alumina duct, titanium (Ti) flanges and Ti sleeves. Before brazing the alumina duct and the Ti sleeves, the Ti sleeves were treated with nitric hydrofluoric acid. The purpose of this study is to clear the effect of this treatment for titanium material. It was cleared by SEM observation that the roughness of the titanium material after the nitric hydrofluoric acid treatment becomes big. It was also measured that the thickness of oxide film on surface of the titanium material was 12.7 nm before treatment and 6.0 nm after treatment. As a result of measuring the wettability of the brazing material which was silver brazing filler metal (Ag: 72%, Cu: 28%) on the Ti surface and the diffusion of the Ti material into the brazing material, it became clear that both the clearing of oxide layer on the alumina ceramics and the vacuum condition of the vacuum heating furnace were important for brazing between alumina ceramics and pure titanium.

DOI •

reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2019-THPTS026

About •

paper received ※ 14 May 2019 paper accepted ※ 23 May 2019 issue date ※ 21 June 2019

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)