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Title Undulator Radiation Dose Caused by Synchrotron Radiation at the European XFEL
  • S. Liu
    DESY, Hamburg, Germany
  • Y. Li, F. Wolff-Fabris
    EuXFEL, Hamburg, Germany
Abstract Radiation damage of the undulators is a big concern for the light sources. At the European XFEL (EuXFEL), dosimeters based on on-line Radfets are used for the un-dulator radiation dose measurements. However, since the Radfets are not only sensitive to the electrons and neu-trons but also to the photons, it can capture the synchro-tron radiation (SR) generated in the undulators, which is not considered to be the main source for undulator radia-tion damage. Therefore, it is important to estimate the contribution of synchrotron radiation to the radiation doses measured by the Radfets. For this purpose, we have first calculated the synchrotron radiation profile using SPECTRA, and then put the profile into the tracking code BDSIM to track it through the whole undulator beam line. The radiation doses from SR have been simulated and compared with the measured values. The differences in the radiation doses measured by the Radfets before and after Pb shielding will also be presented.
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Conference IPAC2019
Series International Particle Accelerator Conference (10th)
Location Melbourne, Australia
Date 19-24 May 2019
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Mark Boland (UoM, Saskatoon, SK, Canada); Hitoshi Tanaka (KEK, Tsukuba, Japan); David Button (ANSTO, Kirrawee, NSW, Australia); Rohan Dowd (ANSTO, Kirrawee, NSW, Australia); Volker RW Schaa (GSI, Darmstadt, Germany); Eugene Tan (ANSTO, Kirrawee, NSW, Australia)
Online ISBN 978-3-95450-208-0
Received 30 April 2019
Accepted 22 May 2019
Issue Date 21 June 2019
DOI doi:10.18429/JACoW-IPAC2019-TUPRB021
Pages 1724-1727
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.