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https://doi.org/10.18429/JACoW-IPAC2019-THPMP049
Title Sequential Excitation Scheme for Laser Stripping of Hydrogen Ion Beams
Authors
  • Y. Liu, A.V. Aleksandrov, S.M. Cousineau, T.V. Gorlov, A. Rakhman
    ORNL, Oak Ridge, Tennessee, USA
Abstract Resonant laser excitation of the electron in a hydrogen atom is essential to achieve high-efficiency laser stripping of hydrogen ion (H⁻) beam. In the laser stripping experiments recently carried out at SNS, an ultra-violet (UV) laser was used to excite the electrons in 1-GeV hydrogen atoms from the n=1 state to the n=3 state. In this talk, we propose a sequential resonant excitation scheme by using two laser beams to excite electrons in a sequence of two steps: from the n=1 state to the n=2 state and from the n=2 state to any higher state. The advantages of the sequential resonant excitation scheme include (1) lower laser power requirement due to higher transition probability in the first excitation step and (2) possibility of shifting the stripping laser wavelength from UV regime to longer wavelengths. An application of the sequential resonant excitation scheme in combination with the double-resonance optical cavity technology to the laser stripping of 1.3-GeV H⁻ beam (envisioned in the SNS proton power upgrade project) will be described.
Funding ORNL is managed by UT-Battelle, LLC, under contract DE-AC05-00OR22725 for the U.S. DOE.
Paper download THPMP049.PDF [0.330 MB / 3 pages]
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Conference IPAC2019
Series International Particle Accelerator Conference (10th)
Location Melbourne, Australia
Date 19-24 May 2019
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Mark Boland (UoM, Saskatoon, SK, Canada); Hitoshi Tanaka (KEK, Tsukuba, Japan); David Button (ANSTO, Kirrawee, NSW, Australia); Rohan Dowd (ANSTO, Kirrawee, NSW, Australia); Volker RW Schaa (GSI, Darmstadt, Germany); Eugene Tan (ANSTO, Kirrawee, NSW, Australia)
Online ISBN 978-3-95450-208-0
Received 14 May 2019
Accepted 21 May 2019
Issue Date 21 June 2019
DOI doi:10.18429/JACoW-IPAC2019-THPMP049
Pages 3558-3560
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.