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| TUPIK002 |
H-, D-, C2-: A Comparison of RF andFilament Powered Volume-Cusp Ion Sources |
1685 |
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- S.V. Melanson, M.P. Dehnel, D.E. Potkins
D-Pace, Nelson, British Columbia, Canada
- H.C. McDonald, C. Philpott
BSL, Auckland, New Zealand
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Today's industrial ion source applications often require high beam currents with long source lifetime and low maintenance. Filament powered ion sources produce high beam currents but are limited by the short lifetime (~5000 mA*h) of the filament, while RF ion sources with external antennas do not require such maintenance. By changing the filament back plate of our TRIUMF licensed ion source to the ceramic window, planar coil antenna and 13.56 MHz RF amplifier of our University of Jyväskylä licensed ion source, we are able to directly compare the effect of the two technologies for powering sources on negative ion production in volume-cusp ion sources for the case of H-, D- and C2- using our ion source test facility.
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| DOI • |
reference for this paper
※ https://doi.org/10.18429/JACoW-IPAC2017-TUPIK002
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