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RIS citation export for WEPAB036: The Diffraction Limited Light Source Elettra 2.0

TY - CONF
AU - Karantzoulis, E.
ED - Schaa, Volker RW
ED - Arduini, Gianluigi
ED - Pranke, Juliana
ED - Seidel, Mike
ED - Lindroos, Mats
TI - The Diffraction Limited Light Source Elettra 2.0
J2 - Proc. of IPAC2017, Copenhagen, Denmark, 14–19 May, 2017
C1 - Copenhagen, Denmark
T2 - International Particle Accelerator Conference
T3 - 8
LA - english
AB - Elettra 2.0 is the next generation to replace Elettra, the Italian third generation light source. The new machine will have an emittance of 0.25 nm-rad with coherent flux about two orders of magnitude higher than that of the present machine. In the paper the aspects of its feasibility are described and discussed.
PB - JACoW
CP - Geneva, Switzerland
SP - 2660
EP - 2662
KW - emittance
KW - dipole
KW - insertion-device
KW - lattice
KW - insertion
DA - 2017/05
PY - 2017
SN - 978-3-95450-182-3
DO - 10.18429/JACoW-IPAC2017-WEPAB036
UR - http://jacow.org/ipac2017/papers/wepab036.pdf
ER -