| Paper | Title | Page |
|---|---|---|
| THPMY017 | A Comparison of Surface Properties of Metallic Thin Film Photocathodes | 3691 |
|
||
| In this work physical vapour deposition magnetron sputtering has been employed to deposit metallic thin films onto Cu, Mo and Si substrates. The use of metallic thin films offers several advantages: (i) metal photocathodes present a fast response time and a relative insensitivity to the vacuum environment (ii) metallic thin films when prepared and transferred in vacuum can offer smoother and cleaner cathode surfaces. The photocathodes developed here will ultimately be used to drive NCRF guns such as that used in VELA and the proposed CLARA light source test facility. The samples grown on Si substrates were used to investigate the morphology and thickness of the film. The samples grown onto Cu and Mo substrates were analysed and tested as photocathodes in a surface characterisation chamber, where X-Ray photoelectron spectroscopy was employed to determine surface chemistry and a Kelvin probe apparatus used to determine work function. QE measurements were enabled using a 266 nm UV laser. | ||
| DOI • | reference for this paper ※ DOI:10.18429/JACoW-IPAC2016-THPMY017 | |
| Export • | reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml) | |