Author: Liu, Y.Q.
Paper Title Page
TUPMB007 Research and Development of the Pulse Bump Magnet for the Injection System in CSNS/RCS 1118
  • L. Huo, M.Y. Huang, W. Kang, Y.Q. Liu, J. Qiu, L. Wang, S. Wang
    IHEP, Beijing, People's Republic of China
  The H stripping painting injection is adopted in the Rapid Cycling Synchrotron (RCS) of China Spallation Neutron Source (CSNS). Painting injection is realized by eight pulse bump magnets. The pulse bump magnet is the key of the performance of painting, as well as the beam loss control. The manufacture and the field measurement of the eight pulse bump magnets have been completed. In the development of the magnets, some key technical problems on fabrication of coil were solved, and the field measurement results show that the magnets fulfil the design specification.  
DOI • reference for this paper ※ DOI:10.18429/JACoW-IPAC2016-TUPMB007  
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