IPAC2016 - List of Authors (Cropper, M.D.)

Paper	Title	Page
TUOCB02	Low Secondary Electron Yield of Laser Treated Surfaces of Copper, Aluminium and Stainless Steel	1089
	R. Valizadeh, P. Goudket, O.B. Malyshev, B.S. Sian, S. Wang STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom M.D. Cropper, S. Wang Loughborough University, Loughborough, Leicestershire, United Kingdom P. Goudket Cockcroft Institute, Warrington, Cheshire, United Kingdom B.S. Sian UMAN, Manchester, United Kingdom N. Sykes Micronanics Laser Solution Center, Didcot, United Kingdom
	Funding: STFC Reduction of SEY was achieved by surface engineering through laser ablation with a laser operating at • = 355 nm. It was shown that the SEY can be reduced to near or below 1 on copper, aluminium and 316LN stainless steel. The laser treated surfaces show an increased surface resistance, with a wide variation in resistance found de-pending on the exact treatment details. However, a treated copper surface with similar surface resistance to aluminium was produced.
	Slides TUOCB02 [94.339 MB]
DOI •	reference for this paper ※ DOI:10.18429/JACoW-IPAC2016-TUOCB02
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THPMY017	A Comparison of Surface Properties of Metallic Thin Film Photocathodes	3691
	S. Mistry, M.D. Cropper Loughborough University, Loughborough, Leicestershire, United Kingdom A.N. Hannah, L.B. Jones, K.J. Middleman, B.L. Militsyn, T.C.Q. Noakes, R. Valizadeh STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
	In this work physical vapour deposition magnetron sputtering has been employed to deposit metallic thin films onto Cu, Mo and Si substrates. The use of metallic thin films offers several advantages: (i) metal photocathodes present a fast response time and a relative insensitivity to the vacuum environment (ii) metallic thin films when prepared and transferred in vacuum can offer smoother and cleaner cathode surfaces. The photocathodes developed here will ultimately be used to drive NCRF guns such as that used in VELA and the proposed CLARA light source test facility. The samples grown on Si substrates were used to investigate the morphology and thickness of the film. The samples grown onto Cu and Mo substrates were analysed and tested as photocathodes in a surface characterisation chamber, where X-Ray photoelectron spectroscopy was employed to determine surface chemistry and a Kelvin probe apparatus used to determine work function. QE measurements were enabled using a 266 nm UV laser.
DOI •	reference for this paper ※ DOI:10.18429/JACoW-IPAC2016-THPMY017
Export •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

Low Secondary Electron Yield of Laser Treated Surfaces of Copper, Aluminium and Stainless Steel

1089

R. Valizadeh, P. Goudket, O.B. Malyshev, B.S. Sian, S. Wang
STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
M.D. Cropper, S. Wang
Loughborough University, Loughborough, Leicestershire, United Kingdom
P. Goudket
Cockcroft Institute, Warrington, Cheshire, United Kingdom
B.S. Sian
UMAN, Manchester, United Kingdom
N. Sykes
Micronanics Laser Solution Center, Didcot, United Kingdom

Funding: STFC
Reduction of SEY was achieved by surface engineering through laser ablation with a laser operating at • = 355 nm. It was shown that the SEY can be reduced to near or below 1 on copper, aluminium and 316LN stainless steel. The laser treated surfaces show an increased surface resistance, with a wide variation in resistance found de-pending on the exact treatment details. However, a treated copper surface with similar surface resistance to aluminium was produced.

Slides TUOCB02 [94.339 MB]

DOI •

reference for this paper ※ DOI:10.18429/JACoW-IPAC2016-TUOCB02

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

THPMY017

A Comparison of Surface Properties of Metallic Thin Film Photocathodes

3691

S. Mistry, M.D. Cropper
Loughborough University, Loughborough, Leicestershire, United Kingdom
A.N. Hannah, L.B. Jones, K.J. Middleman, B.L. Militsyn, T.C.Q. Noakes, R. Valizadeh
STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom

In this work physical vapour deposition magnetron sputtering has been employed to deposit metallic thin films onto Cu, Mo and Si substrates. The use of metallic thin films offers several advantages: (i) metal photocathodes present a fast response time and a relative insensitivity to the vacuum environment (ii) metallic thin films when prepared and transferred in vacuum can offer smoother and cleaner cathode surfaces. The photocathodes developed here will ultimately be used to drive NCRF guns such as that used in VELA and the proposed CLARA light source test facility. The samples grown on Si substrates were used to investigate the morphology and thickness of the film. The samples grown onto Cu and Mo substrates were analysed and tested as photocathodes in a surface characterisation chamber, where X-Ray photoelectron spectroscopy was employed to determine surface chemistry and a Kelvin probe apparatus used to determine work function. QE measurements were enabled using a 266 nm UV laser.

DOI •

reference for this paper ※ DOI:10.18429/JACoW-IPAC2016-THPMY017

Export •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)