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TY - CONF AU - Maslov, V.I. AU - Levchuk (Yarovaya), I.P. AU - Onishchenko, I.N. ED - Petit-Jean-Genaz, Christine ED - Kim, Dong Eon ED - Kim, Kyung Sook ED - Ko, In Soo ED - Schaa, Volker RW TI - Self-focusing and Wakefield-focusing of Relativistic Electron Bunches in Plasma J2 - Proc. of IPAC2016, Busan, Korea, May 8-13, 2016 C1 - Busan, Korea T2 - International Particle Accelerator Conference T3 - 7 LA - english AB - It was shown that at the wakefield excitation by electron bunch, the length of which is equal to half of the wavelength, the ratio of wakefield focusing to self-focusing is large at the end of the bunch, the shape of which is such that it falls from the current maximum value in the head of the bunch to zero at the end of the bunch. However, the ratio of wakefield focusing to self-focusing tends to zero at the end of the bunch, if the current increases along the bunch from zero in the head of the bunch to a maximum value at the end of the bunch. In the case of homogeneous bunch with sharp edges, the length of which is several plasma wavelength, the self-focusing force Fs is constant along the bunch, and wakefield force of focusing changes from -Fs to Fs. In the case of homogeneous bunch with precursor of half current and length, equal to half of wavelength, focusing of bunch is determined by the homogeneous self-focusing force and wakefield focusing force equals zero. Cases of rectangular and Gaussian bunches, the length of which is equal to half of wavelength, also were considered. PB - JACoW CP - Geneva, Switzerland SP - 2602 EP - 2604 KW - focusing KW - wakefield KW - plasma KW - electron KW - space-charge DA - 2016/06 PY - 2016 SN - 978-3-95450-147-2 DO - 10.18429/JACoW-IPAC2016-WEPMY023 UR - http://jacow.org/ipac2016/papers/wepmy023.pdf ER -