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RIS citation export for THPMY014: Study of the Non-evaporable Ti-Zr-V Films Grown on Different Materials

TY - CONF
AU - Wu, L.H.
AU - Cheng, C.M.
AU - Huang, Y.T.
AU - Perng, S.Y.
AU - Sheng, I.C.
AU - Shueh, C.
ED - Petit-Jean-Genaz, Christine
ED - Kim, Dong Eon
ED - Kim, Kyung Sook
ED - Ko, In Soo
ED - Schaa, Volker RW
TI - Study of the Non-evaporable Ti-Zr-V Films Grown on Different Materials
J2 - Proc. of IPAC2016, Busan, Korea, May 8-13, 2016
C1 - Busan, Korea
T2 - International Particle Accelerator Conference
T3 - 7
LA - english
AB - The non-evaporable (NEG) Ti-Zr-V films were coated on the different vacuum-chamber materials, including the extruded aluminum samples (Al), the extruded seamless stainless steel samples (S.S.), CuCrZr alloys, and oxygen-free copper (OFC) plates. The NEG films were fabricated by using the direct current (DC) sputtering method. The secondary electron microscopy images showed that the morphology of NEG films was different on these various substrates. The thermal analysis (TA) presented that exothermic reaction happened by heating the samples.
PB - JACoW
CP - Geneva, Switzerland
SP - 3682
EP - 3684
KW - vacuum
KW - electron
KW - experiment
KW - synchrotron-radiation
KW - booster
DA - 2016/06
PY - 2016
SN - 978-3-95450-147-2
DO - 10.18429/JACoW-IPAC2016-THPMY014
UR - http://jacow.org/ipac2016/papers/thpmy014.pdf
ER -