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DOI:10.18429/JACoW-IPAC2016-THPMY017
Title A Comparison of Surface Properties of Metallic Thin Film Photocathodes
Authors
  • S. Mistry, M.D. Cropper
    Loughborough University, Leicestershre, United Kingdom
  • A.N. Hannah, L.B. Jones, K.J. Middleman, B.L. Militsyn, T.C.Q. Noakes, R. Valizadehpresenter
    STFC/DL/ASTeC, Daresbury, Warrington, Cheshire, United Kingdom
Abstract In this work physical vapour deposition magnetron sputtering has been employed to deposit metallic thin films onto Cu, Mo and Si substrates. The use of metallic thin films offers several advantages: (i) metal photocathodes present a fast response time and a relative insensitivity to the vacuum environment (ii) metallic thin films when prepared and transferred in vacuum can offer smoother and cleaner cathode surfaces. The photocathodes developed here will ultimately be used to drive NCRF guns such as that used in VELA and the proposed CLARA light source test facility. The samples grown on Si substrates were used to investigate the morphology and thickness of the film. The samples grown onto Cu and Mo substrates were analysed and tested as photocathodes in a surface characterisation chamber, where X-Ray photoelectron spectroscopy was employed to determine surface chemistry and a Kelvin probe apparatus used to determine work function. QE measurements were enabled using a 266 nm UV laser.
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Conference IPAC2016, Busan, Korea
Series International Particle Accelerator Conference (7th)
Proceedings Link to full IPAC2016 Proccedings
Session Poster Session
Date 12-May-16   16:00–18:00
Main Classification 02 Photon Sources and Electron Accelerators
Sub Classification T02 Electron Sources
Keywords electron, laser, vacuum, survey, cathode
Publisher JACoW, Geneva, Switzerland
Editors Christine Petit-Jean-Genaz (CERN, Geneva, Switzerland); Dong Eon Kim (PAL, Pohang, Republic of Korea); Kyung Sook Kim (PAL, Pohang, Republic of Korea); In Soo Ko (POSTECH, Pohang, Republic of Korea); Volker RW Schaa (GSI, Darmstadt, Germany)
ISBN 978-3-95450-147-2
Published June 2016
Copyright
Copyright © 2016 by JACoW, Geneva, Switzerland     CC-BY Creative Commons License
cc Creative Commons Attribution 3.0