Author: Zschornack, G.
Paper Title Page
TUPS077 Shaping of Ion Pulses from an Electron Beam Ion Source for Particle Injection into Accelerators 1716
 
  • F. Ullmann, A. Schwan
    DREEBIT GmbH, Dresden, Germany
  • U. Hagen, O. Heid, H. von Jagwitz
    Siemens AG, Healthcare Technology and Concepts, Erlangen, Germany
  • G. Zschornack
    Technische Universität Dresden, Institut für Angewandte Physik, Dresden, Germany
 
  Electron Beam Ion Sources (EBISs) provide highly charged ions for many applications, amongst others for particle injection into accelerators. Although EBISs are limited in ion output they feature a lot of advantages which qualify them for accelerator injection. The ion pulses extracted from the ion sources can be directly injected into an accelerator sequence which however requires ion pulses with distinct shape and length. We present the production of ion pulses matching the requirements of particle injection. The ions are produced by trapping in a high density electron beam for a certain time with electrostatic potentials providing for their axial trapping. The ions are extracted by lowering the trapping potential, i.e. opening the trap. Due to the ion energy distribution within the trapping region ion extraction can be controlled by controlling the trapping potential. A specific time dependent control mode of the trapping potential thus allows to produce ion pulses with designated shape and length. Source parameters such as working gas pressure, electron beam current and energy are influencing the energy distribution of the ions which in turn is influencing pulse shaping.  
 
TUPS078 Electron Beam Ion Sources – A New Access for Particle Acceleration 1719
 
  • F. Ullmann, F. Grossmann, V.P. Ovsyannikov, A. Schwan
    DREEBIT GmbH, Dresden, Germany
  • G. Zschornack
    Technische Universität Dresden, Institut für Angewandte Physik, Dresden, Germany
 
  Electron Beam Ion Sources (EBISs) produce highly charged ions in a high density electron beam. Due to their operational principle EBISs have a lot of advantages although limited in ion output. Since the radial source region is given by a narrow electron beam the extracted ion beam features a very low transversal emittance. Moreover, the ions are ionized by a monoenergetic electron beam resulting in a small variation of the ion energy distribution, and thus in a very low longitudinal emittance. Together with a low basis pressure of less than 10-9 mbar this result in a high quality ion beam. The ions can be extracted as continuous beam as well as ion pulses with distinct pulse shapes. Providing almost any element with any charge state of up to completely ionized ions gives a large number of different projectiles and kinetic energies. The use of EBISs whether based on permanent magnets or on cryogen-free superconducting magnets has been proven in a variety of fields and applications. In addition, their compact design makes them transportable, low in operational costs, and guarantee easy handling.