Author: Grossmann, F.
Paper Title Page
TUPS078 Electron Beam Ion Sources – A New Access for Particle Acceleration 1719
  • F. Ullmann, F. Grossmann, V.P. Ovsyannikov, A. Schwan
    DREEBIT GmbH, Dresden, Germany
  • G. Zschornack
    Technische Universität Dresden, Institut für Angewandte Physik, Dresden, Germany
  Electron Beam Ion Sources (EBISs) produce highly charged ions in a high density electron beam. Due to their operational principle EBISs have a lot of advantages although limited in ion output. Since the radial source region is given by a narrow electron beam the extracted ion beam features a very low transversal emittance. Moreover, the ions are ionized by a monoenergetic electron beam resulting in a small variation of the ion energy distribution, and thus in a very low longitudinal emittance. Together with a low basis pressure of less than 10-9 mbar this result in a high quality ion beam. The ions can be extracted as continuous beam as well as ion pulses with distinct pulse shapes. Providing almost any element with any charge state of up to completely ionized ions gives a large number of different projectiles and kinetic energies. The use of EBISs whether based on permanent magnets or on cryogen-free superconducting magnets has been proven in a variety of fields and applications. In addition, their compact design makes them transportable, low in operational costs, and guarantee easy handling.