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https://doi.org/10.18429/JACoW-ICALEPCS2021-WEPV040
Title Design of Machine Protection System for SXFEL-UF
Authors
  • C.L. Yu, J.G. Ding, H. Zhao
    SSRF, Shanghai, People’s Republic of China
Abstract Shanghai Soft X-ray Free-Electron Laser (SXFEL) facility is divided into two phases: the SXFEL test facility (SXFEL-TF) and the SXFEL user facility (SXFEL-UF). SXFEL-TF has met all the design specifications and has been available in beam operating state. SXFEL-UF is currently under commissioning and is planned to generate 3 nm FEL radiation using a 1.5 GeV electron LINAC. To protect the critical equipment rapidly and effectively from unexpected damage, a reliable safety interlocking system needs to be designed. Machine Protection System (MPS) is designed by Programmable Logic Controller (PLC) and Experimental Physics and Industrial Control System (EPICS) which is based on a master-slave architecture. In order to meet different commissioning and operation requirements, the management and switching functions of eight operation modes are introduced in the MPS system. There are two FEL line in user facility named SXFEL beamline project (BSP) and undulator (UD) , and the corresponding design of MPS is completed. This paper focuses on the progress and challenges associated with the SXFEL-UF MPS.
Paper download WEPV040.PDF [0.976 MB / 5 pages]
Poster download WEPV040_POSTER.PDF [0.883 MB]
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Conference ICALEPCS2021
Series International Conference on Accelerator and Large Experimental Physics Control Systems (18th)
Location Shanghai, China
Date 14-22 October 2021
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Kazuro Furukawa (KEK, Tsukuba, Japan); Yingbing Yan (SARI,Shanghai, China); Yongbin Leng (SARI,Shanghai, China); Zhichu Chen (SARI,Shanghai, China); Volker RW Schaa (GSI, Darmstadt, Germany)
Online ISBN 978-3-95450-221-9
Online ISSN 2226-0358
Received 10 October 2021
Revised 20 October 2021
Accepted 21 November 2021
Issue Date 14 March 2022
DOI doi:10.18429/JACoW-ICALEPCS2021-WEPV040
Pages 750-754
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.