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@inproceedings{ko:ibic2021-mopp27,
author = {J. Ko and T. Ha and G. Hahn and D. Kim and S. Shin},
title = {{EPU-PBPM with CVD-diamond Blade at PLS-II}},
booktitle = {Proc. IBIC'21},
pages = {112--114},
eid = {MOPP27},
language = {english},
keywords = {photon, polarization, undulator, pick-up, synchrotron},
venue = {Pohang, Rep. of Korea},
series = {International Beam Instrumentation Conference},
number = {10},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {10},
year = {2021},
issn = {2673-5350},
isbn = {978-3-95450-230-1},
doi = {10.18429/JACoW-IBIC2021-MOPP27},
url = {https://jacow.org/ibic2021/papers/mopp27.pdf},
note = {https://doi.org/10.18429/JACoW-IBIC2021-MOPP27},
abstract = {{All 18 photon beam position monitors (PBPM) installed on the PLS-II are tungsten blade types. The elliptical polarized undulator (EPU) has the characteristic that the spatial profile of the beam varies depending on the polarization mode. This relates to the thermal load of the blade and changes in the blade material at fixed blade gaps are inevitable. In this paper, we analyze power density and flux density according to EPU mode and describe the process of installing PBPM with CVD-diamond blades on the PLS-II beamline for the first time.}},
}