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TY - CONF AU - Kim, C. AU - Kang, H.-S. AU - Kim, G. AU - Ko, I.S. AU - Ko, J.H. ED - Schaa, Volker RW TI - Micro-Bunching Instability Monitor for X-ray Free Electron Laser J2 - Proc. of IBIC2018, Shanghai, China, 09-13 September 2018 CY - Shanghai, China T2 - International Beam Instrumentation Conference T3 - 7 LA - english AB - A direct method was developed to measure the micro-bunching instability in the X-ray Free Electron Laser (XFEL). The micro-bunching instability comes from the interaction between the electron beam and the coherent synchrotron radiation (CSR), and the FEL intensity can be affected significantly by the micro-bunching instability. However, no effective method had been introduced to monitor the micro-bunching instability, so that we installed a CCD camera to measure the micro-bunching instability after the bunch compressor. The CCD camera showed the micro-bunching instability successfully, and more interesting features of the micro-bunching instability were revealed from it. PB - JACoW Publishing CP - Geneva, Switzerland SP - 404 EP - 406 KW - radiation KW - electron KW - bunching KW - laser KW - linac DA - 2019/01 PY - 2019 SN - 978-3-95450-201-1 DO - DOI: 10.18429/JACoW-IBIC2018-WEPA16 UR - http://jacow.org/ibic2018/papers/wepa16.pdf ER -